簡介
有機硅烷類化合物主要應用在有機合成及有機硅材料領域。在有機合成中,硅烷作為羥基 保護基大量存在,如三甲基氯硅烷,TBSCI,有時作為一個合成子載體存在,如乙烯基三甲基 硅烷,烯丙基三甲基硅烷,六甲基二硅硫烷等,從而實現相應的官能團化反應。有機硅材料領域有硅烷偶聯劑、硅油(硅脂、硅乳液、硅表面活性劑)、高溫硫化硅橡膠、液體硅橡膠、硅 樹脂、封端劑,含硅復合共聚物等。
應用介紹(shao)及參考文獻
1.如乙(yi)烯基(ji)三甲(jia)基(ji)硅烷作為(wei)一個“乙(yi)烯”合成子,用于3+2環加(jia)成反應,應用于有機合成過程中。
圖片來源(yuan)于期刊:Vinyltrimethylsilane, Glenn J. Fegley Gerald L. Larson, Encyclopedia of Reagents for Organic Synthesis, 2008.
2.如(ru)烯(xi)丙基三甲基硅烷,作為一個(ge)烯(xi)丙基化(hua)試劑,應用于艾日(ri)布林或者前(qian)列素類似物(wu)的合(he)成中。
圖片來(lai)源于期刊(kan):W020050118565, WO2019102490
圖片來源(yuan)于期刊:Gary A. Sulikowski et al Org. Lett. 2019, 21, 10048-10051
3.作為聚合引發劑,或者烯姪共(gong)聚物,參(can)與烯姪聚合,形成(cheng)功(gong)能(neng)性(xing)有機(ji)硅材料,如耐水性(xing)硅膠 粘合劑,修飾聚氟乙烯等
技術(shu)優勢
產品純度(du)高,具有(you)百公斤(jin)生產能力(li)
Chemical Name | Allyltrimethylsilane |
Synonym |
Allyltrimethylsilane
{LY} Allyltrimethylsilane
allyltrimethylsilane
{} {LY} Allyltrimethylsilane
{} {} {} {LY} Allyltrimethylsilane
{} {} {} {} {LY} Allyltrimethylsilane
{} {} {} {} {} {LY} Allyltrimethylsilane
{} {} {} {} {} {}
{} {} {} {} {} {} {LY} Allyltrimethylsilane
{} {} {} {} {} {} {} {LY} Allyltrimethylsilane
{} {} {} {} {} {} {} {} {LY} Allyltrimethylsilane
{} {} {} {} {} {} {} {} {} {LY} Allyltrimethylsilane
{} {} {} {} {} {} {} {} {} {} {LY} Allyltrimethylsilane
{} {} {} {} {} {} {} {} {} {} {} {LY} Allyltrimethylsilane
{} {} {} {} {} {} {} {} {} {} {} {} {LY} Allyltrimethylsilane
{} {} {} {} {} {} {} {} {} {} {} {} {} {LY} Allyltrimethylsilane
{} {} {} {} {} {} {} {} {} {} {} {} {} {} {
{} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} Allyltrimethylsilane
{} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} Allyltrimethylsilane
{} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {}
{} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} Allyltrimethyl |
MDL Number | MFCD00008635 |
CAS Number | 762-72-1 |
EC Number | 212-104-5 |
Beilstein Registry Number | 906755 |
PubChem Substance ID | 69808 |
Reaxys-RN | 906755 |
Chemical Name Translation | 烯丙基三甲基硅烷 |
LabNetwork Molecule ID | LN00008514 |
InChI | InChI=1S/C6H14Si/c1-5-6-7(2,3)4/h5H,1,6H2,2-4H3 |
Canonical SMILES | C[Si](C)(C)CC=C |
Signal word |
Danger |
GHS Symbol
WGK Germany | 3 |
Safety Statements | |
- S16 Keep away from sources of ignition - No smoking 遠離火源,禁止吸煙;
- S23 Do not breathe gas/fumes/vapour/spray (appropriate wording to be specified by the manufacturer) 不要吸入氣體/煙霧/蒸汽/噴霧;
- S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接觸后,立即用大量水沖洗并征求醫生意見;
- S33 Take precautionary measures against static discharges 對靜電采取預防措施;
- S36 Wear suitable protective clothing 穿戴適當的防護服;
- S36/37/39 Wear suitable protective clothing, gloves and eye/face protection 穿戴適當的防護服、手套和眼睛/面保護;
- S37 Wear suitable gloves 戴適當手套;
- S9 Keep container in a well-ventilated place 保持容器在通風良好的場所;
|
Risk Statements | |
- R11 Highly flammable 非常易燃
- R36/37/38 Irritating to eyes, respiratory system and skin 對眼睛、呼吸系統和皮膚有刺激性
|
Precautionary statements | |
- P210 Keep away from heat/sparks/open flames/hot surfaces. — No smoking. 遠離熱源/火花/明火/熱的表面。——禁止吸煙。
- P233 Keep container tightly closed. ?保持容器密閉。
- P240 Ground/bond container and receiving equipment. 與地面接觸/連接集裝箱和接受設備。
- P241 Use explosion-proof electrical/ventilating/lighting/…/equipment. 使用防爆電氣/通風/照明/ .../設備。
- P242 Use only non-sparking tools. 只能使用無火花工具。
- P243 Take precautionary measures against static discharge. 采取預防措施,防止靜電放電。
- P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉塵/煙/氣體/煙霧/蒸汽/噴霧。
- P264 Wash hands thoroughly after handling. 處理后要徹底洗凈雙手。
- P264+P265
- P271 Use only outdoors or in a well-ventilated area.? 只能在室外或通風良好的地方使用。
- P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防護手套/防護服/眼睛的保護物/面部保護物。
- P302+P352
- P302+P352+P312+P362+P364
- P303+P361+P353
- P304+P340
- P305+P351+P338
- P312 Call a POISON CENTER or doctor/physician if you feel unwell. 如果你感覺不適,呼叫解毒中心或醫生/醫師。
- P319
- P321 Specific treatment (see … on this label). 具體治療(見本標簽上的)。
- P332+P313
- P332+P317
- P337+P313
- P337+P317
- P362 Take off contaminated clothing and wash before reuse. 脫掉污染的衣服,清洗后方可重新使用
- P362+P364
- P370+P378
- P403+P233
- P403+P235
- P405 Store locked up. 上鎖保管。
- P501 Dispose of contents/container to..… 處理內容物/容器.....
|
Packing Group | II |
UN Number |
1993
UN 1993 3/PG 2 |
Hazard statements | |
- H225 Highly flammable liquid and vapour 高度易燃液體和蒸氣
- H315 Causes skin irritation 會刺激皮膚
- H319 Causes serious eye irritation 嚴重刺激眼睛
- H335 May cause respiratory irritation 可能導致呼吸道刺激
|
Personal Protective Equipment |
Eyeshields, Faceshields, full-face respirator (US), Gloves, multi-purpose combination respirator cartridge (US), type ABEK (EN14387) respirator filter |
Hazard Codes |
3
F;Xi |
Hazard Class | 3 |
Storage condition |
2-8°C, stored under nitrogen
{LY} 2-8°C, stored under nitrogen
{} {LY} 2-8°C, stored under nitrogen
{} {} {LY} 2-8°C, stored under nitrogen
{} {} {} {LY} 2-8°C, stored under nitrogen
{} {} {} {} {LY} 2-8°C, stored under nitrogen
{} {} {} {} {} {LY} 2-8°C, stored under nitrogen
{} {} {} {} {} {} {LY} 2-8°C, stored under nitrogen
{} {} {} {} {} {} {} {LY} 2-8°C, stored under nitrogen
{} {} {} {} {} {} {} {} {LY} 2-8°C, stored under nitrogen
{} {} {} {} {} {} {} {} {} {LY} 2-8°C, stored under nitrogen
{} {} {} {} {} {} {} {} {} {} {LY} 2-8°C, stored under nitrogen
{} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C, stored under nitrogen
{} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C, stored under nitrogen
{} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C, stored under nitrogen
{} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C, stored under nitrogen
{} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C, stored under nitrogen
{} {} {} {} {} {} {} {} {} {} {} {} {} {} { |
用于高分子有機硅化合物的合成
{ALF} Has also been used, in the presence of a catalyst such as p-TsOH, I2, Br2 or TfOH, as a silylating agent for alcohols, phenols and carboxylic acids: Tetrahedron Lett., 21, 835 (1980); J. Org. Chem., 46, 5212 (1981). The advantage over more conventional silylation methods is that the only by-product is the neutral gas propene.
{ALF} Reactions with electrophiles illustrate the ß-effect (see Appendix 4); e.g. acid chlorides with a Lewis acid give allyl ketones: J. Organomet. Chem., 85, 149 (1975):
{uni_hamburg} Short: III/35C4
{ALF} More recent studies have shown that TMS cyclopentanes are also formed in these reactions via a competing [3+2] cycloaddition mechanism: Tetrahedron, 49, 9955 (1993). Chemoselective addition to aldehydes can be accomplished in the presence of a ketone, using Scandium(III)­ trifluoromethanesulfonate hydrate, 40566 as catalyst: Synthesis, 1822 (1998).
{ALF} In the presence of F-, functions as an allyl anion equivalent, affording homoallylic alcohols from carbonyl compounds: Tetrahedron Lett., 3043 (1978), and adding to a variety of Michael acceptors: Tetrahedron Lett., 25, 3213 (1984); J. Org. Chem., 51, 1745 (1986). For a review of reactivity in the presence of Lewis acids and F-, see: J. Prakt. Chem./ Chem. Ztg., 336, 375 (1994).
{ALF} Similarly, carbonyl compounds are converted to homoallylic alcohols: J. Organomet. Chem., 69, C15 (1974). In the TiCl4 promoted reaction with enones, behaves as an allyl anion equivalent, giving the product of conjugate addition (Hosomi-Sakurai reaction): J. Am. Chem. Soc., 99, 1673 (1977); 105, 2354 (1983); Org. Synth. Coll., 7, 443 (1990):
{ALD} Merck: 14,10335
{uni_hamburg} Short: III/35F
{ALD} Merck: 14,10335
Beilstein:4(3)1854